| 摘要 |
PURPOSE:To uniformalize the width of a black matrix and to enable the use of a material which does not generate limitation in light shieldability and has low electric resistance as the black matrix. CONSTITUTION:The black matrix 2 is formed on a glass substrate 1 and thereafter, filter parts 5, 6, 7 of respective colors are formed. This formation is so executed that the ends of the filter parts 5, 6, 7 of the respective colors exist on the black matrix 2 and, therefore, the filter parts 5, 6, 7 of the respective colors are registered with relatively good accuracy and eventually the width of the black matrix 2 is uniformalized. The black matrix 2 and the filter parts 5, 6, 7 of the respective colors are formed with ITO electrodes 3 therebetween and the black matrix 2 is not directly superposed on the filter parts 5, 6, 7 of the respective colors and, therefore, the degradation in the film quality does not arise any more even if metals and resins having the low electric resistance are used for the black matrix 2. |
