| 摘要 |
<p>PURPOSE:To simplify the process for production of a solid state image pickup element by providing a color resist method using dyes as dyestuff and adapting this color resist method to production of the color filters for the solid state image pickup element. CONSTITUTION:A photosensitive compsn. of a photopolymn. type dispersed with the dyes is applied on a base material 1 to form a colored layer 2. This colored layer 2 is thereafter patterned by a lithographic method to form colored patterns 2a on the base material 1. While the base material 1 is heated up in a 60 to 200 deg.C range, the colored patterns 2a are irradiated with light 6 to cure the colored patterns 2a. As a result, the colored patterns are cured at a lower temp. and the deterioration in properties of the dyes is prevented.</p> |
