发明名称 Method for dynamic beam profile generation
摘要 A method for applying a radiation treatment with an arbitrary isodose profile is disclosed. The treatment apparatus has a radiation source which generates a radiation beam with an axis. The apparatus also includes a collimator having a plurality of independently movable plates disposed in the path of the radiation beam and oriented in a direction perpendicular to said beam axis. Each set has two movable plates. Control signals are generated. Two plates within a set of plates are actuated independently in orthogonal directions during the treatment, in response to the control signals, causing the beam to change in width. The intensity of the beam is changed as a function of the position of the plates to generate an arbitrary beam profile. Exemplary profiles which may be generated included rotationally symmetric parabolic profiles and flat profiles.
申请公布号 US5332908(A) 申请公布日期 1994.07.26
申请号 US19930017459 申请日期 1993.02.11
申请人 SIEMENS MEDICAL LABORATORIES, INC. 发明人 WEIDLICH, GEORG A.
分类号 A61N5/10;G21K1/04;G21K5/04;(IPC1-7):G21K1/04 主分类号 A61N5/10
代理机构 代理人
主权项
地址