MANUFACTRUING METHOD FOR POLYSILICON FILM

摘要

The method is for manufacturing a polycrystal silicon thin layer having large grains. The method comprises the steps of: (A) forming a polycrystal silicon on a substrates; (B) etching a polycrystal silicon layer to form seeds; (C) forming amorphous silicon on a substrate and seeds; and (D) growing seeds to form polycrystal silicon.