MANUFACTURE OF PIEZOELECTRIC THIN FILM VIBRATOR

摘要

PURPOSE:To easily form a piezoelectric thin film vibrator on the surface of a silicon wafer with a simple manufacture process being a photolithography process for one side of the wafer only without forming a sacrificial film. CONSTITUTION:In the process of forming the piezoelectric thin film vibrator by applying anisotropic etching of a (100) Si wafer 1, when the (100) Si wafer 1 is subjected to anisotropic etching, a glass mask 21 is used to form an etching mask pattern on a rear side of the (100) Si wafer 1 so that one side of a rectangular opening has an angle theta (e.g. 20-45 deg.) with respect to a (110) axis of the (100) Si wafer 1. The anisotropic etching is applied by using the mask pattern and a hole used to mount the piezoelectric thin film vibrator is made to the (100) Si wafer 1.