| 摘要 |
PURPOSE:To provide a silicon nitride based target material for sputtering with uniform, homogeneous and fine composition having high strength and purity. CONSTITUTION:The silicon nitride based target material for sputtering step is composed of a molded and sintered mixture of silicon nitride powder and polysilazane, especially perhydropolysilazane. In such a constitution, the silicon nitride base target material for sputtering step can be obtained by the polysilazane in extremely high purity discharging the functions as an excellent molding and sintering binder. |
