发明名称 POSITIVE TYPE RADIATION SENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To provide a positive type radiation sensitive resin compsn. useful as a resist especially excellent in focus latitude and also excellent in sensitivity, resolution, residual film rate, developability, pattern shape and heat resistance. CONSTITUTION:This positive type radiation sensitive resin compsn. contains alkali-soluble novolak resin and quinonediazidosulfonic ester of a copolymer of phenols with dicyclopntadiene.
申请公布号 JPH06202317(A) 申请公布日期 1994.07.22
申请号 JP19920358731 申请日期 1992.12.28
申请人 JAPAN SYNTHETIC RUBBER CO LTD 发明人 HIRAOKA RYOICHI;KAJITA TORU;OTA TOSHIYUKI;TSUJI AKIRA
分类号 G03F7/022;G03F7/023;H01L21/027;(IPC1-7):G03F7/022 主分类号 G03F7/022
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