发明名称 |
POSITIVE TYPE RADIATION SENSITIVE RESIN COMPOSITION |
摘要 |
PURPOSE:To provide a positive type radiation sensitive resin compsn. useful as a resist especially excellent in focus latitude and also excellent in sensitivity, resolution, residual film rate, developability, pattern shape and heat resistance. CONSTITUTION:This positive type radiation sensitive resin compsn. contains alkali-soluble novolak resin and quinonediazidosulfonic ester of a copolymer of phenols with dicyclopntadiene. |
申请公布号 |
JPH06202317(A) |
申请公布日期 |
1994.07.22 |
申请号 |
JP19920358731 |
申请日期 |
1992.12.28 |
申请人 |
JAPAN SYNTHETIC RUBBER CO LTD |
发明人 |
HIRAOKA RYOICHI;KAJITA TORU;OTA TOSHIYUKI;TSUJI AKIRA |
分类号 |
G03F7/022;G03F7/023;H01L21/027;(IPC1-7):G03F7/022 |
主分类号 |
G03F7/022 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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