发明名称 Semiconductor manufacturing apparatus and method of manufacturing semiconductor device.
摘要 <p>In a semiconductor manufacturing apparatus, a cleaner (2) is inserted in a space defined between an upper mold (1) and a lower mold (3), which are incorporated in a mold unit. The cleaner (2) has an ultraviolet-ray supply unit (26, 27), an ozone supply unit (28), an ozone collecting unit (29), and a brush. Dirt on the surfaces of the upper and lower molds is decomposed and removed by radiating ultraviolet rays in the atmosphere of heated ozone. &lt;IMAGE&gt;</p>
申请公布号 EP0606648(A2) 申请公布日期 1994.07.20
申请号 EP19930121022 申请日期 1993.12.28
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 EGASHIRA, MIKA, C/O INTELLECTUAL PROPERTY DIV.;NODA, YASUMASA, C/O INTELLECTUAL PROPERTY DIV.;TAKEI, SHINJI, C/O INTELLECTUAL PROPERTY DIV.
分类号 H01L21/56;B08B7/00;B29C33/72;H01L21/00;(IPC1-7):H01L21/56 主分类号 H01L21/56
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