发明名称 |
Semiconductor manufacturing apparatus and method of manufacturing semiconductor device. |
摘要 |
<p>In a semiconductor manufacturing apparatus, a cleaner (2) is inserted in a space defined between an upper mold (1) and a lower mold (3), which are incorporated in a mold unit. The cleaner (2) has an ultraviolet-ray supply unit (26, 27), an ozone supply unit (28), an ozone collecting unit (29), and a brush. Dirt on the surfaces of the upper and lower molds is decomposed and removed by radiating ultraviolet rays in the atmosphere of heated ozone. <IMAGE></p> |
申请公布号 |
EP0606648(A2) |
申请公布日期 |
1994.07.20 |
申请号 |
EP19930121022 |
申请日期 |
1993.12.28 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
EGASHIRA, MIKA, C/O INTELLECTUAL PROPERTY DIV.;NODA, YASUMASA, C/O INTELLECTUAL PROPERTY DIV.;TAKEI, SHINJI, C/O INTELLECTUAL PROPERTY DIV. |
分类号 |
H01L21/56;B08B7/00;B29C33/72;H01L21/00;(IPC1-7):H01L21/56 |
主分类号 |
H01L21/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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