发明名称 RESIST COMPOSITION FOR COLOR FILTER
摘要 <p>PURPOSE:To enhance resolution and heat resistance by incorporating an alkali- soluble novolak resin and at least one of alkali-soluble vinyl polymers, a solvent and a pigment. CONSTITUTION:The resist composition comprises the alkali-soluble novolak resin and at least one of the alkali-soluble vinyl polymers, the solvent and the pigment. The alkali-soluble novolak resin is embodied by the ones obtained by condensing phenols and aldehydes in the presence of an acid catalyst and the alkali-soluble vinyl polymer is embodied by vinylphenol copolymers, resins obtained by hydrogenating polyvinylphenols, and polyvinyl phenols. The alkali- soluble novolak resin and the alkali-soluble vinyl polymer mixed in accordance with sensitivity or resolution or transparency to be required as the resist, and for example, when high resolution is required, 10-300 pts.wt. of the vinyl polymer are mixed with 100 pts.wt. of the novolak resin.</p>
申请公布号 JPH06194827(A) 申请公布日期 1994.07.15
申请号 JP19920344339 申请日期 1992.12.24
申请人 SUMITOMO CHEM CO LTD 发明人 HISHIRO YOSHIKI;TAKEYAMA NAOMIKI;YAMAMOTO SHIGEKI
分类号 G02B5/20;G03F7/022;(IPC1-7):G03F7/022 主分类号 G02B5/20
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