| 摘要 |
PURPOSE:To provide the method, by which the capacitor having the required capacitance value can be manufactured readily in comparison with a conventional method. CONSTITUTION:A laminated type capacitor 33 comprising a first electrode 23, an insulating film 25 and a second electrode 29 is formed on a semiconductor substrate 21. At least one gap part 35, which is opened at the side surface side of the laminated structure 33, is formed at a part in the region, where the first electrode and the second electrode of the laminated structure 33 face to each other. The insulating film 25 is removed through the gap part 35 so that the capacitance value of the capacitor constituted of the laminated structure 33 becomes the required value, or an insulating film 37 is otherwise formed in the gap part 35. |
