发明名称 PRODUCTION OF RADIATION-SENSITIVE COMPOUND AND RADIATION-SENSITIVE RESIN COMPOSITION CONTAINING THE OBTAINED COMPOUND
摘要 PURPOSE:To obtain a radiation-sensitive resin composition with the number of relatively large insoluble grains reduced immediately after the composition is produced, with an increase in the number of insoluble grains reduced even after preservation for a long period (excellent in preservation stability) and to improve the yield in forming an integrated circuit from the composition. CONSTITUTION:A compd. having hydroxyls is esterified by a quinone diazide sulfonic halide in the presence of solvent to produce a radiation-sensitive compd. The halide is brought into contact with solvent and wetted or made into a soln., and the wetted halide or soln. is brought into contact with a compd. having hydroxyls and esterified. The radiation-sensitive resin composition contains the compd. and an alkali-soluble resin.
申请公布号 JPH06194830(A) 申请公布日期 1994.07.15
申请号 JP19920346399 申请日期 1992.12.25
申请人 SUMITOMO CHEM CO LTD 发明人 OOI SATSUO;NAKANISHI HIROTOSHI
分类号 G03F7/022;G03F7/023;H01L21/027;(IPC1-7):G03F7/023 主分类号 G03F7/022
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