| 摘要 |
<p>PURPOSE:To provide the matrix substrate which eliminates the possibility of electric corrosion of electric wirings and ion transfer and lowers the resistance of electric wirings. CONSTITUTION:This matrix substrate is constituted by isolating source wirings 13 and pixel electrodes 15 on an insulating substrate by gate insulating films 6 and lower source wirings 12 formed on the upper layer of the gate insulating films 6. Since the pixel electrodes 15 are patterned earlier than the source wirings 13, the source wirings 13 are not eroded by etching. The lower source wirings 12 consisting of microcrystalline n<+> amorphous silicon are formed under the source wirings 13 and, therefore, there is no need for using a corrosion resistant material for the source wirings 13 and an aluminum alloy of a low resistance is usable.</p> |
