发明名称 |
METHOD AND EQUIPMENT FOR AUTOMATICALLY MEASURING SUBSTITUTIONAL CARBON CONCENTRATION IN SILICON SINGLE CRYSTAL |
摘要 |
<p>PURPOSE:To provide a method and equipment for measuring the substitutional carbon concentration in a silicon single crystal accurately and automatically. CONSTITUTION:When the substitutional carbon concentration in a silicon single crystal is measured using FT-IR method (Fourier Transform Infrared spectrometry), a differential coefficient is calculated basing on the infrared absorbance spectrum obtained from a sample, i.e., a silicon single crystal, and that obtained from a non-carbon silicon single crystal (reference) having substantially identical free carrier absorbance produced by same method as the sample. The differential coefficient is employed in the determination of a differential absorbance spectrum from both infrared absorbance spectrums. Substitutional carbon concentration in the sample is then determined basing on the distance between a base line and a local oscillation absorption peak of the substitutional carbon in the differential absorbance spectrum.</p> |
申请公布号 |
JPH06194310(A) |
申请公布日期 |
1994.07.15 |
申请号 |
JP19930265648 |
申请日期 |
1993.09.29 |
申请人 |
SHIN ETSU HANDOTAI CO LTD |
发明人 |
KUBOTA HIROSHI;TAMAZUKA MASAROU;KITAGAWARA YUTAKA |
分类号 |
G01N21/35;G01N21/00;G01N21/3563;G01N21/3581;(IPC1-7):G01N21/35 |
主分类号 |
G01N21/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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