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发明名称
Resist-Materialien für Lithographie mittels eines Elektronen- oder Röntgenstrahls.
摘要
申请公布号
DE69009503(D1)
申请公布日期
1994.07.14
申请号
DE19906009503
申请日期
1990.01.17
申请人
FUJITSU LTD., KAWASAKI, KANAGAWA
发明人
KOTACHI, AKIKO, C/O FUJITSU LIMITED, KAWASAKI-SHI, KANAGAWA 211;TAKECHI, SATOSHI, C/O FUJITSU LIMITED, KAWASAKI-SHI, KANAGAWA 211;NAKAMURA, YUKO, C/O FUJITSU LIMITED, KAWASAKI-SHI, KANAGAWA 211
分类号
G03F7/039;G03F7/075;H01L21/027;H01L21/30;(IPC1-7):G03F7/075
主分类号
G03F7/039
代理机构
代理人
主权项
地址
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