发明名称 PRODUCTION OF SILICON NITRIDE SINTERED COMPACT
摘要 PURPOSE:To obtain a silicon nitride sintered compact improved in oxidation resistance at medium temperatures, excellent in durability, while retaining excellent high-temperature characteristics, by oxidation treatment with an inorganic acid of a silicon nitride sintered compact containing each specified range of a group IIIa element and excess oxygen. CONSTITUTION:A silicon nitride sintered compact comprising (A) 70-98mol% of silicon nitride, (B) 1.0-10mol%, on an oxide basis, of a group IIIa element and (C) <=25mol%, on a silica(SiO2) basis, of excess oxygen, with the molar ratio C/B of 0.7 to 3, is put to oxidation treatment with an inorganic acid, especifically, immersed for several minutes to several hours in a liquid such as hydrochloric, sulfuric, nitric or hydrofluoric acid, or coated with an acid solution.
申请公布号 JPH06191948(A) 申请公布日期 1994.07.12
申请号 JP19920343738 申请日期 1992.12.24
申请人 KYOCERA CORP 发明人 SATO MASAHIRO
分类号 C04B35/584;C04B35/58;C04B41/85 主分类号 C04B35/584
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