发明名称 Post-processing apparatus with solution's temperature detector
摘要 A post-processing apparatus for washing off a photosensitive layer in a non-image area of an organic photoconductive master plate that has been prepared on a platemaker through the steps of exposure, development and fixing. The apparatus including a swelling/wetting section for rendering the photosensitive layer in the non-image area swollen and wet; a stripping section for stripping and removing the photosensitive layer; a cleaning section for washing the photosensitive layer with water; solution receiving tanks provided for the respective sections for receiving processing solution; spray pipes provided along a width of the master plate for spraying the processing solution from the solution receiving tanks respectively associated with the swelling/wetting, the stripping and the cleaning sections; and a detector for detecting a temperature of the processing solution. The detector being provided in a rear end of a fluid passageway of the spray pipe in the swelling/wetting section. The apparatus further including an outlet for injecting the processing solution toward the master plate, the outlet being bored in a wall of the rear end portion of the spray pipe facing with a temperature sensing head of the detector; a heater for the processing solution being provided in the solution receiving tank of the swelling/wetting section; and a controller for controlling the heater according to an output signal from the detector.
申请公布号 US5329331(A) 申请公布日期 1994.07.12
申请号 US19930005398 申请日期 1993.01.15
申请人 IWATSU ELECTRIC CO., LTD. 发明人 HATORI, NOBUYOSHI;KOIKE, TOSHIO
分类号 H01L21/56;G03D5/04;G03D13/00;G03F7/30;(IPC1-7):G03D13/00 主分类号 H01L21/56
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