| 摘要 |
<p>PURPOSE:To improve the preserving stability without changes in the sensitivity of a photoresist composition by a method wherein an innermost layer of resin layers is made of a resin which does not contain a photoprotective agent, and one of the resin layers other than the innermost layer is made of a resin containing a photoprotective agent which has an enough photoprotective property against the photosensitivity of the photoresist composition. CONSTITUTION:A resin layer constituting a container consists of at least two layers of an outer layer and an inner layer. The inner layer is an inner most layer 2 made of a high density polyethylene resin which does not contain a photoprotective agent. On the other hand, the outer layer is a photoprotective layer 1 made of the polyethylene resin which is same at used for the inner layer but is mixed with a anthraquinone type organic pigment. A parison is extruded by using a two-layer extruding die and is blow-molded into the container. Thereby, when a photoresit composition is stored in the container, a photoresist having a high-resolving power can be obtained because the photoresist changes slightly in the sensitivity after stored and is excellent in the preserving stability.</p> |
