发明名称 |
SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF |
摘要 |
PURPOSE:To obtain a Bi-CMOS free from deterioration of bipolar transistor characteristics. CONSTITUTION:A bipolar transistor and a CMOSFET which are mutually isolated by a field oxide film 15 are formed on a semiconductor substrate 1. The gate electrode 67 of an NMOSFET and the gate electrode 69 of a PMOSFET are made thicker than the emitter electrode 38 of the bipolar transistor.
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申请公布号 |
JPH06188375(A) |
申请公布日期 |
1994.07.08 |
申请号 |
JP19930200334 |
申请日期 |
1993.07.19 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
WATABE KIYOTO |
分类号 |
H01L27/06;H01L21/331;H01L21/8249;H01L29/73;H01L29/732;(IPC1-7):H01L27/06 |
主分类号 |
H01L27/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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