发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
摘要 PURPOSE:To obtain a Bi-CMOS free from deterioration of bipolar transistor characteristics. CONSTITUTION:A bipolar transistor and a CMOSFET which are mutually isolated by a field oxide film 15 are formed on a semiconductor substrate 1. The gate electrode 67 of an NMOSFET and the gate electrode 69 of a PMOSFET are made thicker than the emitter electrode 38 of the bipolar transistor.
申请公布号 JPH06188375(A) 申请公布日期 1994.07.08
申请号 JP19930200334 申请日期 1993.07.19
申请人 MITSUBISHI ELECTRIC CORP 发明人 WATABE KIYOTO
分类号 H01L27/06;H01L21/331;H01L21/8249;H01L29/73;H01L29/732;(IPC1-7):H01L27/06 主分类号 H01L27/06
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