| 摘要 |
<p>The present invention provides methods for producing water insoluble, aqueous alkali soluble polyhydroxystyrene having a very low level of chloride and metal ions, utilizing treated anionic and acidic ion exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such polyhydroxystyrene and for producing semiconductor devices using such photoresist compositions.</p> |
