发明名称 |
Procedure for fabricating a pressure transducer using the silicon on isolation technique and transducer thus obtained. |
摘要 |
<p>The procedure of the invention comprises the following steps: a) - making a monocrystalline silicon film (44) on a silicon substrate (6) and separated at least locally from the latter by an insulating layer (42); b) - making an opening (24) in the silicon film down to the insulating layer; c) - partially removing the insulating layer via the said opening in order to form the diaphragm in the silicon film; d) - replugging the said opening (26). <IMAGE></p> |
申请公布号 |
EP0605302(A2) |
申请公布日期 |
1994.07.06 |
申请号 |
EP19930403156 |
申请日期 |
1993.12.23 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
DIEM, BERNARD;DELAYE, MARIE-THERESE |
分类号 |
G01L9/04;B81B3/00;G01L9/00;G01L9/12;H01L29/84;(IPC1-7):G01L9/12;G01L9/06 |
主分类号 |
G01L9/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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