发明名称 Procedure for fabricating a pressure transducer using the silicon on isolation technique and transducer thus obtained.
摘要 <p>The procedure of the invention comprises the following steps: a) - making a monocrystalline silicon film (44) on a silicon substrate (6) and separated at least locally from the latter by an insulating layer (42); b) - making an opening (24) in the silicon film down to the insulating layer; c) - partially removing the insulating layer via the said opening in order to form the diaphragm in the silicon film; d) - replugging the said opening (26). <IMAGE></p>
申请公布号 EP0605302(A2) 申请公布日期 1994.07.06
申请号 EP19930403156 申请日期 1993.12.23
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 DIEM, BERNARD;DELAYE, MARIE-THERESE
分类号 G01L9/04;B81B3/00;G01L9/00;G01L9/12;H01L29/84;(IPC1-7):G01L9/12;G01L9/06 主分类号 G01L9/04
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