发明名称 |
Electron beam excited ion irradiation apparatus |
摘要 |
In an electron beam excited ion irradiation apparatus which irradiates ions to a material, an electrical discharge changes an inert gas into a plasma. Electrons are drawn from this plasma and are made into electron beams. The electron beams are passed through an active gas to create ion. When the ion is irradiated to a material, electron components of the electron beams, which are irradiated vertically to a surface of the material are changed their irradiation direction. Control of the range of electron beam irradiation is performed by a magnetic filed formed so as to surround the ion beams.
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申请公布号 |
US5326981(A) |
申请公布日期 |
1994.07.05 |
申请号 |
US19920950661 |
申请日期 |
1992.09.25 |
申请人 |
KAWASAKI JUKOGYO KABUSHIKI KAISHA;RIKEN INSTITUTE OF PHYSICAL AND CHEMICAL RESEARCH |
发明人 |
HARA, TAMIO;HAMAGAKI, MANABU;AOYAGI, KATSUNOBU;YAMADA, TAKESHI;RYOJI, MAKOTO;TOKAI, MASAKUNI;KAJIYAMA, YOSUKE |
分类号 |
H01J27/04;H01J37/305;H01J37/32;(IPC1-7):H01J37/30 |
主分类号 |
H01J27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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