发明名称 Electron beam excited ion irradiation apparatus
摘要 In an electron beam excited ion irradiation apparatus which irradiates ions to a material, an electrical discharge changes an inert gas into a plasma. Electrons are drawn from this plasma and are made into electron beams. The electron beams are passed through an active gas to create ion. When the ion is irradiated to a material, electron components of the electron beams, which are irradiated vertically to a surface of the material are changed their irradiation direction. Control of the range of electron beam irradiation is performed by a magnetic filed formed so as to surround the ion beams.
申请公布号 US5326981(A) 申请公布日期 1994.07.05
申请号 US19920950661 申请日期 1992.09.25
申请人 KAWASAKI JUKOGYO KABUSHIKI KAISHA;RIKEN INSTITUTE OF PHYSICAL AND CHEMICAL RESEARCH 发明人 HARA, TAMIO;HAMAGAKI, MANABU;AOYAGI, KATSUNOBU;YAMADA, TAKESHI;RYOJI, MAKOTO;TOKAI, MASAKUNI;KAJIYAMA, YOSUKE
分类号 H01J27/04;H01J37/305;H01J37/32;(IPC1-7):H01J37/30 主分类号 H01J27/04
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