| 摘要 |
PURPOSE:To stabilize the resistance value of a thermal resistor layer with the improvement of splitting precision of a feeder layer by forming a slope through generation of large size-etching when the first etching is applied to the feeder layer and then performing the second etching after bending and bonding a regist layer on the slope. CONSTITUTION:A regist layer 8 is formed by spin coating technique on a feeder layer 4 laminated using a sputtering process, and then a solvent is evaporated by heating. After this, a mask pattern is formed by photoengraving technique. If about half of the thickness of the feeder layer 4 is etched, significant side- etching is generated because of a weak adhesion between the regist layer 8 and the feeder layer 4, resulting in the formation of a slope 4c. Next, the regist layer 8 is liquefied by heating it at 160-180 deg.C so that both ends 8a are bent on the slope 4c of the feeder layer 4. Following this process, the remaining thickness of the feeder layer 4 is etched and then a protection layer is coated by sputtering to form a thermal head. By employing this manufacturing formula, the splitting precision of the feeder layer 4 is improved and the dispersion of a dot area of the thermal resistor layer 3 is insignificant with a resistance value becoming stable. |
