发明名称 VERTICAL HEAT TREATMENT APPARATUS AND HEAT INSULATING MATERIAL.
摘要 <p>A vertical heat treatment apparatus which has a heat insulating body having heat insulating property, high allowable over-load and pressure resistance sufficient to cope with the increase in the diameter of a substrate and with the treatment of many substrates, and being suitable especially to heat treatment apparatus for semiconductor and TFT substrates. In the apparatus, especially, on the top of a heat insulating table (40), a jig (4) for holding substrates is provided, and in the lower space of the table (40) a heat insulating material (50) made of a porous material is stored. This vertical heat treatment apparatus is characterized in that a space (B) for storing the heat insulating material is gastightly isolated from a space (A) for storing substrates by the heat insulating table (40), and the space (B) can be ventilated, decompressed or compressed via a base (70) supporting the heat insulating table (40), or via the part where a flange part (41) of the heat insulating table contacts with the base (70). <IMAGE></p>
申请公布号 EP0603391(A1) 申请公布日期 1994.06.29
申请号 EP19920909800 申请日期 1992.05.15
申请人 SHIN-ETSU QUARTZ PRODUCTS CO., LTD. 发明人 OKOSHI, SHINICHI, TAKEFU WORKS SHIN-ETSU;KIMURA, HIROYUKI, TAKEFU WORKS SHIN-ETSU
分类号 C30B31/10;C30B31/12;C30B33/00;F27B17/00;F27D7/02;(IPC1-7):F27B17/00 主分类号 C30B31/10
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