发明名称 |
VERTICAL HEAT TREATMENT APPARATUS AND HEAT INSULATING MATERIAL. |
摘要 |
<p>A vertical heat treatment apparatus which has a heat insulating body having heat insulating property, high allowable over-load and pressure resistance sufficient to cope with the increase in the diameter of a substrate and with the treatment of many substrates, and being suitable especially to heat treatment apparatus for semiconductor and TFT substrates. In the apparatus, especially, on the top of a heat insulating table (40), a jig (4) for holding substrates is provided, and in the lower space of the table (40) a heat insulating material (50) made of a porous material is stored. This vertical heat treatment apparatus is characterized in that a space (B) for storing the heat insulating material is gastightly isolated from a space (A) for storing substrates by the heat insulating table (40), and the space (B) can be ventilated, decompressed or compressed via a base (70) supporting the heat insulating table (40), or via the part where a flange part (41) of the heat insulating table contacts with the base (70). <IMAGE></p> |
申请公布号 |
EP0603391(A1) |
申请公布日期 |
1994.06.29 |
申请号 |
EP19920909800 |
申请日期 |
1992.05.15 |
申请人 |
SHIN-ETSU QUARTZ PRODUCTS CO., LTD. |
发明人 |
OKOSHI, SHINICHI, TAKEFU WORKS SHIN-ETSU;KIMURA, HIROYUKI, TAKEFU WORKS SHIN-ETSU |
分类号 |
C30B31/10;C30B31/12;C30B33/00;F27B17/00;F27D7/02;(IPC1-7):F27B17/00 |
主分类号 |
C30B31/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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