FORMATION OF MICROMINIATURE STRUCTURE AND X-RAY MASK

摘要

PURPOSE:To form a micromiature structure having high aspect ratio by employing a resist mainly composed of a copolymer of a unit shown by a specific formula and a unit shown by another specific formula in a resist layer thereby forming a resist pattern deep in vertical direction in a short exposing time. CONSTITUTION:When a resist layer is formed on the surface of a substrate or a solid body, a monomer shown by formula I (where, R1 represents an 1-4C alkyl group (hydrogen atom in alkyl group may be substituted by halogen atom)) and a monomer shown by formula II (where, X represents halogen atom or hydroxyl group and R2 represents hydrogen atom or methyl group) are previously polymerized to prepare a copolymer syrup thereof. The copolymer syrup is applied onto a substrate or the surface of a solid body. A copolymer syrup layer thus formed on the substrate or the surface of solid body is then polymerized completely through polymerization completing process.