| 发明名称 |
Method for producing non-monocrystalline semiconductor device and apparatus therefor |
| 摘要 |
An apparatus for producing a non-monocrystalline semiconductor device having two film forming chambers. The apparatus has means for transferring a substrate from one film forming chamber to the other film forming chamber while maintaining the first film forming chamber in a plasma atmosphere.
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| 申请公布号 |
US5324360(A) |
申请公布日期 |
1994.06.28 |
| 申请号 |
US19920886048 |
申请日期 |
1992.05.20 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KOZUKA, KIRAKU |
| 分类号 |
C23C16/509;C23C16/54;(IPC1-7):C23C16/50 |
主分类号 |
C23C16/509 |
| 代理机构 |
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