| 摘要 |
PURPOSE:To prevent misalignment of a pattern by irradiating a workpiece with a UV laser beam through a mask formed with plural patterns and successively forming patterns on the workpiece. CONSTITUTION:A UV laser beam is emitted from an excimer laser generator 1. The workpiece is irradiated with the UV laser beam through the mask 5, and a prescribed micro-fabrication is performed on the workpiece 18. Then, the workpiece is irradiated with the UV laser beam through the mask 5 of which the plural patterns are formed on a dielectric thin film, and the patterns are successively formed on the workpiece. At the time of forming the patterns successively, the mask 5, an optical system 6 and the workpiece 18 are driven each singly or combinedly. Thus, plural kinds of processing are performed with little influence on processing accuracy for the workpiece. |
