发明名称 Method of fabricating an electronic interconnection
摘要 Disclosed is a method of fabricating an electronic interconnection structure comprising at least one solder column Joined to an I/O pad of a substrate, the method including the steps of: (a) applying a quantity of solder to the solder column or I/O pad; (b) aligning the solder column with the I/O pad such that there is a quantity of solder between them; (c) heating the structure to cause the solder to melt and bond the column to the I/O pad; and (d) planarizing the solder column to a predetermined height. Also disclosed is the electronic interconnection structure made by the method according to the invention.
申请公布号 US5324892(A) 申请公布日期 1994.06.28
申请号 US19920926494 申请日期 1992.08.07
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 GRANIER, FRANCOIS J.;RIEU, JEAN-JACQUES M.;RAOUT, PHILIPPE;SANCHEZ, ANDRE
分类号 H01L23/50;H01R4/02;H01R43/02;H05K3/34;H05K3/36;(IPC1-7):H05K1/00 主分类号 H01L23/50
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