发明名称 SURFACE POTENTIAL CONTROL IN PLASMA PROCESSING OF MATERIALS
摘要 SURFACE POTENTIAL CONTROL IN PLASMA PROCESSING OF MATERIALS An object (30) is plasma processed by placing an electrically conducting grid (34) over all or a portion of the surface (32) of the object (30) so that the grid (34) generally follows the contours of the surface (32) but is displaced outwardly from the surface (32). Ions or electrons from a plasma surrounding the object (30) are accelerated into the surface (32) of the object (30) using as a processing driving force an electrical potential applied to the electrically conducting grid (34). The use of a contoured conducting grid (34) allows plasma processing of large, electrically nonconducting objects and objects having sharp surface features or recesses.
申请公布号 CA2112178(A1) 申请公布日期 1994.06.24
申请号 CA19932112178 申请日期 1993.12.22
申请人 HUGHES AIRCRAFT COMPANY 发明人 MATOSSIAN, JESSE N.;SCHUMACHER, ROBERT W.;PEPPER, DAVID M.
分类号 B29C35/08;B29C59/14;C23C8/36;C23C14/32;C23C14/48;H01J37/317;H01L21/265;(IPC1-7):H05H1/03;H05H1/34;H05H1/42;H05H5/02 主分类号 B29C35/08
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