发明名称 EXPOSURE DEVICE OF ROTARY SCANNING SYSTEM
摘要 PURPOSE:To expose patterns with high accuracy over the entire surface on a circular disk surface by will maintaining the flatness of a circular reticule. CONSTITUTION:The circular reticule R is imposed on the holding part 4 of a rotary driving section 3 and a flat plate 5 is disposed on the circular reticule R apart a slight spacing therefrom. Gas of a prescribed pressure is supplied between the flat plate 5 and the circular reticule R via a through-hole 5c in the central part of the flat plate 5. The circular reticule R is attracted to the plane plate 5 by Bernoulli theorem, by which the deflection of the circular reticule R is corrected.
申请公布号 JPH06176408(A) 申请公布日期 1994.06.24
申请号 JP19920324020 申请日期 1992.12.03
申请人 NIKON CORP 发明人 HAYASHI YUTAKA
分类号 G03F7/20;G11B7/26;H01L21/027;H01L21/30;(IPC1-7):G11B7/26 主分类号 G03F7/20
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