METHOD FOR DESIGNING PATTERN OF SHIFTER LIGHT SHIELDING TYPE PHASE SHIFT PHOTOMASK

摘要

PURPOSE:To provide a method for designing the patterns of a shifter light shielding type phase shift photomask effective for forming a good resist on a wafer which sets the adequate values of the sizes and shapes of the light shielding patterns of this shifter light shielding type phase shift photomask. CONSTITUTION:This method for designing the shifter light shielding type phase shift photomask consists is characterized by setting the adequate values of the sizes of the fight shielding patterns from a correlative diagram of the light intensity distribution to the distances between the light shielding pattern edges and phase shifter pattern edges or the light intensity peaks to the distances between the light shielding pattern edges and the phase shifter pattern edges via a light intensity distribution simulator at the time of designing the patterns of the shifter light shielding type phase shift photomask.