| 摘要 |
<p>PURPOSE:To obtain the pattern of a superconducting device as designed by providing the corner parts of all patterns with projecting parts or recessed parts, thereby forming the resist patterns having high accuracy and joining these patterns to form the mask for wiring patterns. CONSTITUTION:A resist 12 is formed by spin coating on a substrate 11 and is then prebaked. The composite photomask 13 having the projecting parts formed by superposing correction patterns of, for example, 0.28mum square on the corner parts of mask patterns consisting of, for example, 1.5mum square in joining area is subjected to pattern transfer by UV light 14 (Fig. (a)). The resist 12 in the unexposed region after the pattern transfer and the resist 15 of the exposed region are shown (Fig. (b)). The resists are then developed by using a prescribed alkaline developer and is spin-dried after washing to form the resist pattern 16 consisting of 1.5mum square joining area. As a result, the corner parts of the resist patterns are rectangular in sectional shape as shown within the round mark of the dotted line of Fig. (c). The photomask having the high accuracy is thus obtd.</p> |
