| 摘要 |
<p>PURPOSE:To provide a blank for a mask for exposure in which patterns can be formed in exact order by vacuum-depositing plural light shielding layers each made of a metal film in a single vacuum deposition process. CONSTITUTION:Two or more light shielding layers 3, 5, 6 each made of a metal film are laminated on a transparent substrate 2 for a mask for exposure and protective layers 4, 4a for protecting the light shielding layers 3, 5, 6 from etching after development are interposed between the layers 3, 5 and between the layers 5, 6 to obtain the objective blank for a mask for exposure.</p> |
