| 摘要 |
<p>PURPOSE:To adsorb and hold a material to be processed and to uniformly process it irrespective of presence/absence of a plasma. CONSTITUTION:A first electrode 6 and a second electrode 7 disposed on a concentrical circle are interposed to be held between two polymer films 5A and 5B to constitute an electrostatic chuck sheet 5 to cover a susceptor 4. The electrode 6 is connected to a positive electrode side of a DC power source 63, and the electrode 7 is connected to a negative electrode side of a DC power source 73 and a positive electrode side of the power source 63 through a switch. The switch is so constituted that, the electrode 7 is switched to the negative electrode side of the power source 73 when a plasma is not generated and the electrode 7 is switched to the positive electrode side of the power source 63 when the plasma is generated. Thus, even if the plasma is not generated, a material to be processed is adsorbed, and since the plasma is generated, the electrodes 6, 7 are set to the same potential, etching is executed uniformly.</p> |
