发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PURPOSE:To make a chamber small-sized without producing a dead space in the chamber. CONSTITUTION:A first filter box 3 is arranged and installed in a dead space part at the upper part of a reticle library 11 inside a chamber and of a reticle conveyance robot 12, a second filter box 4 is arranged and installed in a dead space part at the upper part of a wafer carrier 13 and of a wafer conveyance robot 14, and they are made to communicate with the discharge side of a blower 2C inside a machine chamber 2 by a first duct 5A and a second duct 5B. A reheating device 2B and a cooler 2A are arranged and installed on the intake side of the blower 2C inside the machine chamber 2, at least one out of both is controlled by a temperature controller 2D, and an atmospheric gas is air- conditioned to a prescribed temperature and sent to filter boxes 3, 4. The filter boxes 3, 4' discharge a lean atmospheric gas from respectively tilted outlet faces.
申请公布号 JPH06176998(A) 申请公布日期 1994.06.24
申请号 JP19920352608 申请日期 1992.12.10
申请人 CANON INC 发明人 NAKANO KAZUSHI;KOSUGI MASAO
分类号 H01L21/30;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/30
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