Vertikale Vorrichtung zur Wärmebehandlung von Halbleitern,申请号DE19934342976-传众专利搜索

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发明名称	Vertikale Vorrichtung zur Wärmebehandlung von Halbleitern
摘要
申请公布号	DE4342976(A1)	申请公布日期	1994.06.23
申请号	DE19934342976	申请日期	1993.12.16
申请人	TOSHIBA CERAMICS CO., LTD., TOKIO/TOKYO	发明人	INABA, TAKESHI, YAMAGATA;TOYA, EIICHI, YAMAGATA;TANAKA, TAKASHI, YAMAGATA;SASAKI, YASUMI, YAMAGATA
分类号	H01L21/205;C23C16/01;C23C16/32;C23C16/34;C30B25/12;H01L21/22;H01L21/31;H01L21/673;H01L21/683;(IPC1-7):H01L21/68;H01L21/324	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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