发明名称 WAFER PROCESSING MACHINE VACUUM FRONT END METHOD AND APPARATUS
摘要 <p>A carrousel type wafer processing machine in which wafers are held in vertical orientations in holders on a rotatable plate and sequenced through a plurality of processing stations for processing, such as by the application of a sputtered film thereto, is provided with a vacuum front end module that transfers wafers between cassette modules in which the wafers are horizontally disposed and a loading and unloading station of the processing machine, through a transfer chamber. The transfer chamber includes a wafer transfer arm, an aligning station, a preheating and degassing station, a cooling station preferably combined with the preheating station, and an uprighting station from which wafers are exchanged with the processing machine. The arm moves unprocessed wafers individually from a cassette module to the aligner, then to the preheating station, then to the uprighting station. The arm also moves processed wafers from the uprighting station, to the cooling station and to a cassette module. Preferably, one cassette module is being vented, reloaded or replaced, and pumped to a vacuum while the wafers of the other are being cycled through the processing machine.</p>
申请公布号 WO1994014185(A1) 申请公布日期 1994.06.23
申请号 US1993011765 申请日期 1993.12.03
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址