| 摘要 |
The invention relates to monomers of the formulae R<1>-SO2-N(CO-OR<2>)-R<3>-O-CO-CR<4> = CH2 and R<1>-N(CO-OR<2>)-SO2-R<3>-O-CO-CR<4> = CH2, in which R<1> is a (C1 -C20)alkyl, (C3-C10)cycloalkyl, (C6-C14)aryl or (C7-C20)aralkyl radical, where, in the alkyl-containing radicals, individual methylene groups may be replaced by heteroatoms, R<2> is a (C3-C11)alkyl, (C3-C11)alkenyl or (C7-C11)aralkyl radical, R<3> is an unsubstituted or substituted (C1-C6)alkyl, (C3-C6)cycloalkyl, (C6-C14)aryl or (C7-C20 )aralkyl radical, and R<4> is a hydrogen atom or a methyl group. It furthermore relates to polymers containing at least 5 mol% of units containing side groups of the formula(e) -R<3>-N(CO-OR<2>)-SO2-R<1> (I) and/or -R<3>-SO2-N(CO-OR <2 )-R<1> (II), and to a radiation-sensitive mixture containing a) a compound which forms an acid on exposure to actinic radiation and b) an acid-cleavable compound whose cleavage products have greater solubility in an aqueous-alkaline developer than does the starting compound, where the acid-cleavable compound is a polymer of the said type, and to a recording material having a support (carrier, base) and a radiation-sensitive coating. The mixture according to the invention is particularly suitable for the production of offset printing plates and photoresists.
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