摘要 |
PURPOSE:To provide a method for polishing a material to be polished such as optical parts like a bismuth substitution iron garnet crystal used for a light isolator, etc., a ferrite base plate for a microwave integrated circuit, a magnetic garnet for static magnetic wave element by using an ultraviolet hardening type tape. CONSTITUTION:In a polishing process, a work 1 is bonded on a plate 3 through which ultraviolet ray can pass, by using a ultraviolet ray hardening type double- sided tape 2, and after the polishing, the work 1 is irradiated by ultraviolet ray and separated from an ultraviolet ray hardening type double-sided tape 2. |