发明名称 |
Dry developable photoresist compositions and method for use thereof |
摘要 |
Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of being inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.
|
申请公布号 |
US5322765(A) |
申请公布日期 |
1994.06.21 |
申请号 |
US19910796527 |
申请日期 |
1991.11.22 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CLECAK, NICHOLAS J.;CONLEY, WILLARD E.;KWONG, RANEE W.-L.;LINEHAN, LEO L.;MACDONALD, SCOTT A.;SACHDEV, HARBANS S.;SCHLOSSER, HUBERT;WILLSON, CARLTON G. |
分类号 |
G03F7/004;G03F7/029;G03F7/038;G03F7/039;G03F7/26;G03F7/36;G03F7/38;H01L21/027;H01L21/30;(IPC1-7):G03C1/72;G03F7/00 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|