| 摘要 |
Disclosed is a method of manufacturing a carbon substrate for a magnetic disk capable of increasing the treatment rate leading to a lowering of the manufacturing cost, reducing the variation of the surface roughness of each substrate, and the variation of the surface roughness among the substrates in each lot. The surface of a carbon substrate is roughened to have a surface roughness Ra of 10-500 ANGSTROM by dry etching. The examples of the dry etching methods include chemical dry etching, barrel etching, plasma etching, RIE, RIBE, and ion milling.
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