| 发明名称 |
Process for improved quality of CVD copper films |
| 摘要 |
Chemical Vapor Deposition of copper films is enhanced by simultaneously introducing in the reactor vapor of an organometallic copper precursor and copper complex vapor of a volatile ligand or the hydrate of the ligand.
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| 申请公布号 |
US5322712(A) |
申请公布日期 |
1994.06.21 |
| 申请号 |
US19930064185 |
申请日期 |
1993.05.18 |
| 申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
NORMAN, JOHN A. T.;HOCHBERG, ARTHUR K.;ROBERTS, DAVID A. |
| 分类号 |
C23C16/14;C23C16/18;H01L21/28;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/14 |
| 代理机构 |
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