发明名称
摘要 PURPOSE:To contrive economization of energy and easy control of film quality and to obtain a deposited film consisting of metal, compound or alloy having uniforms physical characteristics and superconductivity with excellent productivity and mass productivity even if said film has a large area by bringing >=1 raw materials which can be made gaseous and gaseous oxidizing agent into contact with each other to chemically form precursors. CONSTITUTION:The gaseous He filled in cylinders 101, 103 is blown into respective raw material vessels 107, 108 in which the respective raw materials for forming the deposited film are filled and are heated to bubble the materials. These gases are then introduced through introducing pipes 109, 110 into a vacuum chamber 102. The gaseous halogen oxidizing agent which has the oxidation effect on the above-mentioned materials and is filled in a cylinder 104 is introduced by a gas introducing pipe 111 into the chamber 120 and is brought into contact with the above-mentioned materials to chemically form the plural precursors including the precursors in the excited state. The deposited film mentioned above is formed from >=1 such precursors as the supply source for the deposited film constituting element on a substrate 118 which exists in the film forming space in the chamber 120.
申请公布号 JPH0645891(B2) 申请公布日期 1994.06.15
申请号 JP19850285280 申请日期 1985.12.18
申请人 发明人
分类号 H01L31/04;C23C16/30;C23C16/44;G03G5/08;H01L21/205;(IPC1-7):C23C16/44 主分类号 H01L31/04
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