| 摘要 |
PURPOSE:To provide a process for production of an optical waveguide parts which can determine the relative positions of guide grooves with optical waveguides with high accuracy. CONSTITUTION:A clad layer 2 and a core layer 3 are formed on an Si substrate 1. Further, a photoresist 4 is formed on this core layer 3. Optical waveguide patterns and guide groove patterns are formed on this photoresist 4. The clad layer 2 and core layer 3 are patterned by RIE processing using the photoresist 4, by which the optical waveguides 5 are formed. The guide groove patterns 6 are formed simultaneously therewith. The Si substrate 1 is then anisotropically etched with the patterned clad layers 2 and core layers 3 as a mask, to form the V-grooves 8. |
