Method of forming a pattern from a photosensitive heat-resistant poly(amide)imide having hydroxyphenyl groups

摘要

A photosensitive polymer containing a repeating unit represented by the following formula (I) and having a logarithmic viscosity number of from 0.1 to 5 dl/g as measured in a solvent at a temperature of 30+/-0.01 DEG C. at a concentration of 0.5 g/dl: (I) (wherein R1 is a trivalent or tetravalent carbocyclic aromatic group or heterocyclic group, R2 is an aliphatic group having at least two carbon atoms, an alicyclic group, an aromatic aliphatic group, a carbocyclic aromatic group, a heterocyclic group or a polysiloxane group, R3 is a divalent organic group, R4 is a hydrogen atom or a monovalent organic group, R5 is a hydrogen atom or a monovalent organic group, m is independently 1 or 2, n is independently 0 or 1, and m and n meet 1