| 摘要 |
PURPOSE:To provide a developing device capable of ensuring a high precision resist pattern stabilized at all times using a chemical amplification type resist without depending upon the elapsed time until a processing is transferred to a developing processing after exposure to light. CONSTITUTION:There is formed integrally with a cassette station 3 and a storage unit 8 for storing a wafer 1 accomodated in a cassette 2 and already exposed to light until the wafer is transferred to a developing processing and temperature and atmosphere in the storage unit 8 is adjusted by an air conditioner 9. |
