| 摘要 |
PURPOSE:To provide positive type photosensitive polymer composition and a relief pattern with the unexposed area having less film wear and tear obtained by using it. CONSTITUTION:This is the manufacture of positive type photosensitive polymer composition containing salt compound of compound represented by the formula (R1 is an alkyl group of 1-3 carbon atoms, R2 is an alkylene group of 1-4 carbon atoms R3, R4 are alkyl groups of 1-3 carbon atoms, (m) is a 0-3 integer, (n) is a 1-3 integer, (p) is 0 or 1) with polyamide acid and quinone diazide compound, and a relief pattern using it. |
