POSITIVE RESIST COMPOSITION

摘要

PURPOSE:To provide positive resist composition of a chemical amplification type which has high sensitivity and resolution and suits eximlaser resist to form a pattern excellent in sectional shape. CONSTITUTION:Positive resist composition contains (A) compound to generate acid with radiation exposure and (B) mixture of (a) phenolic hydroxyl group content compound with 10-60mol% of hydroxyl groups protected by tert- butoxycarbonyl groups and (b) polyhydroxystyrene hydoride with 5-60mol% of hydroxyl groups protected by tert-butoxycarbonyl groups having a hydride rate of 1-40mol% and a weight-average molecular weight of 3000-20000, as essential components.