发明名称 Conditioning of a substrate for electroless plating thereon
摘要 A dielectric substrate is conditioned for subsequent electroless plating thereon by contacting with a catalytic metal salt and then with a reducing agent and with an electroless metal plating bath followed by contacting with a second catalytic metal salt. In addition, a dielectric substrate is conditioned for electroless plating thereon by obtaining a substrate of a dielectric material that contains metal particles therein and contacting with a catalytic metal salt.
申请公布号 US5318803(A) 申请公布日期 1994.06.07
申请号 US19900614669 申请日期 1990.11.13
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BICKFORD, HARRY R.;CANFIELD, DENNIS A.;GRAHAM, ARTHUR E.;TISDALE, STEPHEN L.;VIEHBECK, ALFRED
分类号 C23C18/52;C23C18/28;C23C18/31;H05K3/18;(IPC1-7):B05D1/00 主分类号 C23C18/52
代理机构 代理人
主权项
地址