发明名称 |
Conditioning of a substrate for electroless plating thereon |
摘要 |
A dielectric substrate is conditioned for subsequent electroless plating thereon by contacting with a catalytic metal salt and then with a reducing agent and with an electroless metal plating bath followed by contacting with a second catalytic metal salt. In addition, a dielectric substrate is conditioned for electroless plating thereon by obtaining a substrate of a dielectric material that contains metal particles therein and contacting with a catalytic metal salt.
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申请公布号 |
US5318803(A) |
申请公布日期 |
1994.06.07 |
申请号 |
US19900614669 |
申请日期 |
1990.11.13 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BICKFORD, HARRY R.;CANFIELD, DENNIS A.;GRAHAM, ARTHUR E.;TISDALE, STEPHEN L.;VIEHBECK, ALFRED |
分类号 |
C23C18/52;C23C18/28;C23C18/31;H05K3/18;(IPC1-7):B05D1/00 |
主分类号 |
C23C18/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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