发明名称 Plating rate improvement for electroless silver and gold plating
摘要 An electroless silver or gold plating solution comprising a noncyanide metal complex, a thiosulfate, a sulfite, and at least one amino acid. These electroless plating solutions containing an amino acid exhibit an accelerated plating rate compared to identical solutions lacking amino acids.
申请公布号 US5318621(A) 申请公布日期 1994.06.07
申请号 US19930104723 申请日期 1993.08.11
申请人 APPLIED ELECTROLESS CONCEPTS, INC. 发明人 KRULIK, GERALD A.;MANDICH, NENAD V.;SINGH, RAJWANT
分类号 C23C18/42;(IPC1-7):C23C18/31 主分类号 C23C18/42
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