| 摘要 |
Apparatus for the deposition of a material such as diamond on a substrate by chemical vapor deposition is provided. The apparatus comprises: support shelf on which the substrate is located; a resistance heating element in the form of an elongate strip of conductive material having at least one curved section in its length; the elongate strip being positioned relative to, and spaced from, the substrate such that it presents an elongate edge to the substrate and an elongate edge away from the substrate; and means such as a perforated pipe for causing reaction gas for the deposition to pass across the elongate strip from one longitudinal edge to the other and then to the support shelf and the substrate located thereon.
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